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Increase in Generation of Poly-Crystalline Silicon by Atmospheric Pressure Plasma-Assisted Excimer Laser Annealing |
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| Authors: | Alexander Gredner Christoph Gerhard Stephan Wieneke Kai Schmidt Wolfgang Viol |
| Affiliation: | [1]Laboratory for Laser and Plasma Technologies, University of Applied Sciences and Arts, G6ttingen 3 7085, Germany [2]Application Center for Plasma and Photonic, Fraunhofer Institute for Surface Engineering and Thin Films, GOttingen 37085,Germany [3]Coherent Laser Systems GmbH ＆ Co. KG, Gottingen 37079, Germany |
| Abstract: | Excimer laser annealing, laser-plasma processes, amorphous silicon, polycrystalline silicon, display technology. |
| Keywords: | Excimer laser annealing laser-plasma processes amorphous silicon polycrystalline silicon display technology |
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