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1064 nm倍频波长分离膜的制备与性能研究
引用本文:马小凤,张东平,王英剑,范书海,高卫东,范正修,邵建达.1064 nm倍频波长分离膜的制备与性能研究[J].中国激光,2005,32(6):35-838.
作者姓名:马小凤  张东平  王英剑  范书海  高卫东  范正修  邵建达
作者单位:1. 中国科学院上海光学精密机械研究所光学薄膜技术研发中心,上海,201800;中国科学院研究生院,北京,100039
2. 中国科学院上海光学精密机械研究所光学薄膜技术研发中心,上海,201800
基金项目:国家863项目(2003AA311040)资助。
摘    要:通过对主膜系添加匹配层并借助计算机对膜系进行优化,设计出结构规整、性能优良的1064ilm倍频波长分离膜。用电子束蒸发及光电极值监控技术在K9玻璃基底上沉积薄膜,将样品置于空气中在260℃温度下进行3h热退火处理。然后用Lambda 900分光光度计测量了样品的光谱性能;用表面热透镜(STL)技术测量了样品的弱吸收值;用调Q脉冲激光装置测试了样品的抗激光损伤阈值(LIDT)。实验结果发现,样品的实验光谱性能与理论光谱性能有很好的一致性。退火前后其光谱性能几乎没有发生温漂,说明薄膜的温度稳定性好;同时退火使样品的弱吸收减小,从而其激光损伤阈值提高。理论和实验结果均表明,对主膜系添加匹配层的方法是1064nm倍频波长分离膜设计的较好方法。

关 键 词:薄膜  倍频波长分离膜  弱吸收  激光损伤阈值
收稿时间:2004/7/14

Fabrication and Properties Study of Harmonic Beam Splitter at 1064 nm
MA Xiao-feng,ZHANG Dong-ping,WANG Ying-jian,FAN Shu-hai,GAO Wei-dong,FAN Zheng-xiu,SHAO Jian-da.Fabrication and Properties Study of Harmonic Beam Splitter at 1064 nm[J].Chinese Journal of Lasers,2005,32(6):35-838.
Authors:MA Xiao-feng  ZHANG Dong-ping  WANG Ying-jian  FAN Shu-hai  GAO Wei-dong  FAN Zheng-xiu  SHAO Jian-da
Affiliation:MA Xiao-feng 1,2,ZHANG Dong-ping 1,2,WANG Ying-jian 1,FAN Shu-hai 1,2,GAO Wei-dong 1,2,FAN Zheng-xiu 1,SHAO Jian-da 1 1 R&D Center for Optical Thin Film coatings,Shanghai Institute of Optics and Fine Mechanics,The Chinese Academy of Sciences,Shanghai 201800,China 2 Graduate School of the Chinese Academy of Sciences,Beijing 100039,China
Abstract:A harmonic beam splitter with a simply regular structure and good optical characteristics was designed by adding matching layers between the basic stack and its media and optimizing with a computed-aided film stack design procedure. Coatings were deposited on K9 glass substrates by electron beam evaporation and photoelectric maximum control method, and then annealed in air at 260 ℃ temperature for three hours. The optical properties of coatings were characterized with a Lambda 900 spectrophotometer, the weak absorption of coatings was measured by surface thermal lensing technique (STL), and laser-induced damage threshold (LIDT) was assessed using 1064 nm Q-switch pulsed laser at a pulse length of 12 ns. It was found that a good agreement between the theoretical and the experimental transmittance was obtained, there was almost no shift for the center wavelength after annealing at 260 ℃, which showed the sample had a good temperature stability, the absorption of the coating decreased after annealing, and a remarkable increase of LIDT was found with the decrease of absorption. The experimental results as well as the theoretical ones indicated that it was a good method to add matching layers to the basic stack for a harmonic beam splitter at 1064 nm.
Keywords:thin films  harmonic beam splitter  weak absorption  laser-induced damage threshold
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