Aryl functionalization as a route to band gap engineering in single layer graphene devices |
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Authors: | Zhang Hang Bekyarova Elena Huang Jhao-Wun Zhao Zeng Bao Wenzhong Wang Fenglin Haddon Robert C Lau Chun Ning |
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Affiliation: | Department of Physics and Astronomy, University of California , Riverside, California 92521, United States. |
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Abstract: | Chemical functionalization is a promising route to band gap engineering of graphene. We chemically grafted nitrophenyl groups onto exfoliated single-layer graphene sheets in the form of substrate-supported or free-standing films. Our transport measurements demonstrate that nonsuspended functionalized graphene behaves as a granular metal, with variable range hopping transport and a mobility gap ~0.1 eV at low temperature. For suspended graphene that allows functionalization on both surfaces, we demonstrate tuning of its electronic properties from a granular metal to a semiconductor in which transport occurs via thermal activation over a transport gap ~80 meV from 4 to 300 K. This noninvasive and scalable functionalization technique paves the way for CMOS-compatible band gap engineering of graphene electronic devices. |
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