离子束辅助沉积氧化镁薄膜

为了获得等离子体显示器的介质保护膜，利用离子束辅助沉积技术制备了致密的MgO薄膜；通过X射线衍射仪、扫描电镜、光电子能谱分析了MgO薄膜的特性及特性和工艺参数之间的关系。结果表明：薄膜主要显示（200）晶面的择优取向；从断面形貌、密度及折射率来看，离子束辅助沉积制备的MgO薄膜比电子束蒸发制备的MgO薄膜更致密，薄膜和基底间的结合力更强；离子能量，基底温度，沉积速率及退火处理影响薄膜的结晶，离子能量为1KeV时，薄膜结晶性最好，在离子能量固定为1KeV时，基底温度或沉积速率降低都能提高薄膜的结晶度；空气为退火有助于薄膜的进一步生长。

Magnesium Oxide Films Prepared by Ion Beam-assisted Deposition

Dense MgO films for a protective layer of plasma display screen have been prepared by ion beam-assisted deposition. Properties of the deposited films and relationships between the deposition parameters and the properties have been investigated using X-ray diffractometry, scanning electronic microscopy and X-ray photoelectron spectroscopy (XPS). The deposited films exhibit mainly (200) preferable orientation. From the cross-sectional morphology, the density and the refractive index, it can be known that the MgO films prepared by ion beam-assisted deposition are much denser and more adhesive to substrate than the films deposited by electron beam evaporation. Ion energy, substrate temperature, growth rate and annealing treatment affect the orientation of the MgO films. The best crystallinity of the MgO films can be obtained for ion bombardment with energy of 1keV. With ion energy of 1keV, the orientation. of the MgO films becomes better for lower substrate temperature or growth rate. Annealing treatment in dry air is beneficial to the grain growth further.