| SPC在微电路生产中腐蚀工序的应用 |
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| 引用本文： | 赵金茹,王春栋,秦永伟,李俊. SPC在微电路生产中腐蚀工序的应用[J]. 电子与封装, 2010, 10(10): 35-37,43 |
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| 作者姓名： | 赵金茹 王春栋 秦永伟 李俊 |
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| 作者单位： | 中国电子科技集团公司第58研究所,江苏无锡,214035 |
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| 摘 要： | 文章介绍了统计过程控制(SPC)的基本概念和基本原理,以及在微电路生产中腐蚀工序的应用。详细介绍潜在工序能力指数和实际工序能力指数的区别以及双侧规格下的常规计算方法,给出实际生产中工序能力指数的判断准则。研究SPC在腐蚀工序中在线设备运转状态和产品的关键工艺参数的监控内容及方式。讨论SPC实施过程中控制图的建立过程、参数数据的采集、控制图的选用、常用的判异准则以及如何进行工序能力评价。结合实例,论证腐蚀工艺控制过程中出现失控点时的分析思路和处理方法。
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| 关 键 词： | SPC 控制图 腐蚀工序 |
Application of SPC in Etching Process in the Microcircuit Fabrication |
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| ZHAO Jin-ru,WANG Chun-dong,QIN Yong-wei,LI Jun. Application of SPC in Etching Process in the Microcircuit Fabrication[J]. Electronics & Packaging, 2010, 10(10): 35-37,43 |
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| Authors: | ZHAO Jin-ru WANG Chun-dong QIN Yong-wei LI Jun |
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| Affiliation: | ZHAO Jin-ru,WANG Chun-dong,QIN Yong-wei,LI Jun(China Electronics Technology Group Corporation No.58 Research Institute,Wuxi 214035,China) |
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| Abstract: | Concept and basic principle of static process contro(lSPC)and their application in etching process in the microcircuit fabrication are introduced.The difference between hidden exponents of the processing ability and actual exponents of the processing ability and the normal calculation method of the bilateral specification are all presented in detail.Meanwhile,the judgment regulations of exponents of the processing ability during the actual processing are given.Usage of SPC in monitoring the machine working ... |
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| Keywords: | SPC control-graph etching process |
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