Formation of β-Si3N4 Coatings by Chemical Vapor Deposition |
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Authors: | Kiichi Oda Tetsuo Yoshio Kazuo O-Oka |
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Affiliation: | Research Institute for Non-Crystalline Materials, School of Engineering, Okayama University, Tsushima, Okayama 700, Japan |
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Abstract: | BetaSi3N4 coatings were obtained by chemical vapor deposition in a fused-silica reaction tube by outside heating of the system SiCl4-NH3-N2 at a deposition temperature (reaction tube temperature) of 1300°C, whereas α- and α+β-phase coatings were obtained at depositon temperatures of 1150° and 1250°C, respecively. Formation of β-phase coatings at relatively low temperatures is explained in terms of the effect of a catalytic impurity, SiO vapor from the reaction tube. The X-ray diffraction patterns and sulface morphologies of the coatings were studied. |
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