| X射线光电子能谱在材料表面研究中的应用 |
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| 引用本文： | 余锦涛,郭占成,冯婷,支歆.X射线光电子能谱在材料表面研究中的应用[J].表面技术,2014,43(1):119-124. |
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| 作者姓名： | 余锦涛 郭占成 冯婷 支歆 |
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| 作者单位： | 北京科技大学 钢铁冶金新技术国家重点实验室, 北京 100083;北京科技大学 钢铁冶金新技术国家重点实验室, 北京 100083;北京科技大学 冶金实验技术中心, 北京 100083;北京科技大学 钢铁冶金新技术国家重点实验室, 北京 100083 |
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| 基金项目： | 国家高技术研究发展计划(863 计划) 资助项目(2011AA06A105) |
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| 摘 要： | 通过阐述XPS测试原理及工作特点,讨论其在材料表面研究中的具体应用。通过光电子谱峰位置、形状和强度,可以分析元素价态、含量。角分辨XPS可以检测超薄样品表面的化学状态,成像XPS可以显示样品表面的元素和价态分布,从而进行微区分析。利用氩离子刻蚀进行深度剖析,可以研究样品化学状态随深度的变化关系。
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| 关 键 词： | X射线光电子能谱 表面分析 材料研究 |
| 收稿时间： | 2013/8/20 0:00:00 |
| 修稿时间： | 2013/12/10 0:00:00 |
Application of X-ray Photoelectron Spectroscopy in Material Surface Research |
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| YU Jin-tao;GUO Zhan-cheng;FENG Ting;ZHI Xin.Application of X-ray Photoelectron Spectroscopy in Material Surface Research[J].Surface Technology,2014,43(1):119-124. |
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| Authors: | YU Jin-tao;GUO Zhan-cheng;FENG Ting;ZHI Xin |
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| Affiliation: | State Key Laboratory of Advanced Metallurgy, University of Science and Technology Beijing, Beijing 100083, China;State Key Laboratory of Advanced Metallurgy, University of Science and Technology Beijing, Beijing 100083, China;Metallurgical Experimental Center, University of Science and Technology Beijing, Beijing 100083, China;State Key Laboratory of Advanced Metallurgy, University of Science and Technology Beijing, Beijing 100083, China |
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| Abstract: | This paper briefly reviewed the principle and characteristics of XPS in surface analysis, and described its specific application in material research. The position, shape and intensity of XPS peaks can be used for determining the chemical valence and content of elements. Ultrathin sample can be analyzed by the angle-resolved XPS method. Imaging XPS could show the distribution of element on the surface of samples and its chemical valence. Through depth profiling using argon-ion etching, the variation of sample chemical state with depth can be revealed. |
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| Keywords: | X-ray photoelectron spectroscopy( XPS) surface analysis material research |
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