The effects of quenching just after deposition for metastable compounds |
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Authors: | H Nagai T Ōgushi T Numata |
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Affiliation: | (1) Department of Electronics, Faculty of Engineering, Kagoshima University, Kagoshima, Japan |
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Abstract: | It has been demonstrated that high rate d.c. magnetron sputtering can easily prepare materials such as Nb3Ge and Nb3Si in a metastable state. This sputtering-system was made in an effort to stabilize the metstable phases. Specimens were quenched just after sputtering from 1100° C to liquid N2 temperature at the rate of 3500° C min–1. The relation between quenching rate and superconducting onset temperture, T
c0, the transition width, T
c, and the lattice constant, a
0 were examined. The results show that quenching just after sputtering is very useful in preparing metastable materials. |
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Keywords: | |
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