| 膜去溶进样ICP-MS法测定电子级高纯盐酸中痕量金属杂质 |
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| 引用本文： | 孟蓉,李红华,黄志齐.膜去溶进样ICP-MS法测定电子级高纯盐酸中痕量金属杂质[J].质谱学报,2005,26(Z1):5-6. |
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| 作者姓名： | 孟蓉 李红华 黄志齐 |
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| 作者单位： | 北京化学试剂研究所,北京,100022 |
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| 文章编号： | 1004-2997(2005)增刊-05-02 |
| 修稿时间： | 2005年6月18日 |
Determination of Trace Metal Elements in Electronic High Purity Hydrochloric Acid by ICP-MS With Membrane Desolvation |
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| MENG Rong,LI Hong-hua,HUANG Zhi-qi.Determination of Trace Metal Elements in Electronic High Purity Hydrochloric Acid by ICP-MS With Membrane Desolvation[J].Journal of Chinese Mass Spectrometry Society,2005,26(Z1):5-6. |
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| Authors: | MENG Rong LI Hong-hua HUANG Zhi-qi |
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| Abstract: | Determination of thirty four trace metal elements in electronic high purity hydrochloric acid by ICP-MS (Standard Condition, Plasma Screen Condition) with membrane desolvation was described. Matrix effects were compensated by adding rhodium as the internal standard. Detection limits is 0.1 to 100 ng/L; the recovery of the method is 90%-110%. Long term RSD was less than 5%. The results from ICP and ICP-MS are correspondent. ICP-MS improves the accuracy and efficiency of analyses. |
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| Keywords: | ICP-MS electronic high purity hydrochloric acid trace metal elements membrane desolvation |
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