Structure and tribological property of MoSx-CrTiAlN film by unbalanced magnetron sputtering |
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| Affiliation: | 1. Department of Metallurgy, Federal University of Rio Grande do Sul, RS, Brazil;2. Department of Materials, Federal University of Rio Grande do Sul, RS, Brazil;3. Institute of Physics, Federal University of Rio Grande do Sul, RS, Brazil |
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| Abstract: | MoSx-CrTiAlN film was deposited on Mg alloy substrates using unbalanced magnetron sputtering. First of all, the CrTiAlN layer was synthesized in a gas mixture of Ar + N2, and then the MoSx layer on CrTiAlN were deposited by a single MoSx target. The composition, structure and tribological property of MoSx-CrTiAlN film were characterized by X-ray photoelectron spectrometry, X-ray diffraction, transmission electron microscopy and ball-on-disc tester. The experimental results show that crystallography structure of CrTiAlN layer is FCC whilst the MoSx layer has a mixed microstructure with hexagonal and amorphous state. The coefficient of friction of MoSx-CrTiAlN film is a function of load and shows a steady decreasing with the increasing in applied load. |
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