| 湿法腐蚀的红外热像对比研究 |
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| 引用本文： | 范超,叶玉堂,焦世龙,刘霖,陈镇龙,吴云峰,王昱琳,田骁. 湿法腐蚀的红外热像对比研究[J]. 光电子．激光, 2006, 17(7): 875-879 |
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| 作者姓名： | 范超 叶玉堂 焦世龙 刘霖 陈镇龙 吴云峰 王昱琳 田骁 |
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| 作者单位： | 电子科技大学光电信息学院,四川,成都,610054 |
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| 基金项目： | 国家高技术研究发展计划(863计划);教育部科学技术研究项目;四川省科技计划;国防重点实验室基金 |
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| 摘 要： | 提出了一种研究半导体湿法腐蚀进程的红外热像法。将半导体基片浸泡于化学试剂中，利用红外热像仪探测红外腐蚀信号，并由计算机进行处理，得到热像图。对GaAs在不同配比溶剂中的腐蚀进程进行了红外热像的对比研究，结果表明：红外热像法可以观测到对比实验的显著差异，并直观地表征了基片、腐蚀剂以及腐蚀时间的相互关系。
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| 关 键 词： | 红外热像 湿法腐蚀 半导体 |
| 文章编号： | 1005-0086（2006）07-0875-05 |
| 收稿时间： | 2005-09-25 |
| 修稿时间： | 2005-09-252006-03-06 |
A Contrastable Research of Wet-etching Using Infrared Thermo-image |
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| FAN Chao,YE Yu-tang,JIAO Shi-long,LIU Lin,CHEN Zhen-long,WU Yun-feng,WANG Yu-lin,TIAN Xiao. A Contrastable Research of Wet-etching Using Infrared Thermo-image[J]. Journal of Optoelectronics·laser, 2006, 17(7): 875-879 |
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| Authors: | FAN Chao YE Yu-tang JIAO Shi-long LIU Lin CHEN Zhen-long WU Yun-feng WANG Yu-lin TIAN Xiao |
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| Affiliation: | School of Opto-electronic Information, University of Electronic Science and Technology, Chengdu 610054,China |
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| Abstract: | An infrared thermalimage method which is used to study the wet etching process of semiconductor is proposed. The substrate of semiconductor is dipped into a chemical bath,the infrared radiation signal of etching is detected by the infrared thermo-image instrument and sent to computer to process,the picture of infrared thermo-image can be obtained by this method. The wet-etching of GaAs in different chemical bathes is discussed. Theoretical analysis and experimental result show that the distinct difference of experiment can be monitored by the new infrared thermo-image method,and the relative relation of the three main factors-substrate,chemical baths and time of etching--can be indicated by the method directly. |
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| Keywords: | infrared thermo-image wet-etching semiconductor |
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