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Liquid phase epitaxial growth of InAs1-xSbx on GaSb
Authors:E. R. Gertner  A. M. Andrews  L. O. Bubulac  D. T. Cheung  M. J. Ludowise  R. A. Riedel
Affiliation:(1) Rockwell International Science Center, 91360 Thousand Oaks, California
Abstract:Reported here, for the first time, is the lattice matched growth of InAs1-xSbx on GaSb. The thermodynamic incompatibility of the system, i.e., the strong tendency for the In-As-Sb liquid to dissolve the GaSb substrate, was solved via a novel liquid phase epitaxial growth technique. Liquid compositions for lattice matching conditions have been determined in the 400-600°C range. Epitaxial growth has been examined for (100), (111)B and (111)A orientations. Dislocation etch pit densities for lattice matched, and near lattice matched conditions are shown to be less than 104-cm−2 and 105-cm−4, respectively. The composition of the epitaxial layers are determined by the Gandolfi X-ray diffraction technique and compositional homogeneity has been confirmed by SEM X-ray analysis. Some material related device properties which demonstrate the reproducibility of the growth technique are presented.
Keywords:InAs1-xSbx   Liquid Phase Epitaxy
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