Pyroelectric properties and X-ray photoelectron spectroscopic study of R.F. magnetron-sputtering-derived PZT thin films deposited on various interlayers |
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| Authors: | Chul-Ho Park Mi-Sook Won Chul-Su Lee Won-Hyo Cha Young-Gook Son |
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| Affiliation: | (1) School of Materials Science & Engineering, Pusan National University, Pusan, 609-735, Korea;(2) Korea Basic Science Institute, Busan Branch, Pusan National University, Busan, 609-735, Korea |
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| Abstract: | PZT thin films and interlayers were fabricated by the radio frequency (r.f.) Magnetron-sputtering from the Pb1.1Zr0.53Ti0.47O3, PbO and TiO2 target. As a result of the XPS depth profile analysis, we can confirm that the substrate temperature affects the oxidation
condition of each element of interlayers and the PZT film. Compared to the PZT/Pt structure, the dielectric and pyroelectric
properties of PZT thin films inserted by interlayers were measured to a relatively high value. In particular, the PZT/PbO
structure had the highest pyroelectric properties (P = 189.4 μC/cm2K; F
D = 12.7×10−6 Pa−1/2; F
V = 0.018 m2/C). |
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| Keywords: | PZT thin film Pyroelectric properties Oxidation condition Interlayer |
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