Tunneling-based SRAM

This paper describes a new high-density low-power circuit approach for implementing static random access memory (SRAM) using low current density resonant tunneling diodes (RTDs). After an overview of semiconductor random access memory architecture and technology, the concept of tunneling-based SRAM (TSRAM) is introduced. Experimental results for a compound semiconductor 1-bit 50-nW TSRAM gain cell using low current density (~1 A/cm²) RTDs and low-leakage heterostructure field effect transistors are presented. We describe a one-transistor TSRAM cell which could convert silicon dynamic RAM (DRAM) to ultradense SRAM if an ultralow current density (~1 μA/cm² ) silicon bistable device is developed. Finally, we present experimental and simulation results for a TSRAM cell using multipeaked I-V curve devices and a multivalued word line. This approach aims at increasing storage density through vertical integration of bistable devices such as RTD's