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Effect of negative pulsed high-voltage-bias on diamond-like carbon thin film preparation using capacitively coupled radio-frequency plasma chemical vapor deposition |
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| Authors: | Y Ohtsu H Noda T Misawa M Akiyama |
| Affiliation: | a Department of Electrical and Electronic Engineering, Saga University 1 Honjo-machi, Saga 840-8502, Japan b On-site Sensing and Diagnosis Research Laboratory, National Institute of Advanced Industrial Science and Technology, Shuku, Tosu, Saga 841-0052, Japan c Plasma Department, National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor, P.O.Box MG 36, 077125, Magurele, Bucharest, Romania |
| Abstract: | Mechanical properties of diamond-like carbon films by an effective addition of negative pulsed high-voltage-bias have been investigated in capacitively coupled CH4/Ar radio-frequency plasma. The results revealed that hardness and elastic modulus of the deposited film, estimated from nano-indentation load-displacement curve for about 1 μm-thick films, increase with the increase of the absolute value of high-voltage VNPHV for VNPHV < 5 kV and then saturate. Elastic recovery R got the highest value (> 90%) at VNPHV = 5 kV. |
| Keywords: | 52 77 -j 52 77 Dq 81 05 Uw 81 15 Gh 81 15 Jj |
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