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Raman spectroscopy study of DLC films prepared by RF plasma and filtered cathodic arc |
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| Authors: | Peter C.T. Ha D.R. McKenzie S.C.H. Kwok P.K. Chu |
| Affiliation: | a Applied Physics and Plasma Group, School of Physics, University of Sydney, Sydney, NSW, Australia b Department of Physics and Materials Science, City University of Hong Kong, Hong Kong, China c Ion Beam Processing Lab, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore |
| Abstract: | The build-up of intrinsic stress in carbon thin films deposited by vapour deposition can be a major cause of delamination. Arguably, this issue has been one of the main reasons why the industrial exploitation of carbon vapour deposited films has so far been of limited success. In the present study we deposited single and multilayer thin films of carbon and found that under certain deposition conditions, we were able to produce thin films free from delamination.Single and multilayer of films Diamond-like Carbon (DLC) were prepared by Plasma Immersion Ion Implantation and Deposition (PIIID) from two deposition systems: (1) Radio-Frequency (RF) plasma and (2) Filtered Cathodic Vacuum Arc (FCVA). Raman spectroscopy revealed a shift in the peaks previously identified as D and G band in the structures. The sp2 and sp3 ratio contents were characterized by Raman spectroscopy. |
| Keywords: | Raman Diamond-like carbon RF FCVA |
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