Pulsed ion extraction from a hybrid plasma using a shunting arc discharge |
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Authors: | Ken Yukimura Kenichi Ego Koichi Takaki Tamiya Fujiwara |
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Affiliation: | a Department of Electrical Engineering, Faculty of Engineering, Doshisha University, 1-3 Tatara-Miyakodani, Kyotanabe, Kyoto 610-0321, Japan b Department of Electrical and Electronics Engineering, Iwate University, 4-3-5 Ueda, Morioka, Iwate 020-8551, Japan |
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Abstract: | A hybrid plasma is generated by combining a burst methane rf (195 kHz) plasma with a carbon shunting arc discharge. The shunting arc discharge triggers the rf methane plasma. As a result, the rf plasma is initiated over a wide range of ambient gas pressure from 0.045 Pa as a base pressure to a methane pressure of 1.26 Pa, at which the rf plasma is not self-ignited. When a target is immersed in the rf- and shunting arc-hybrid plasma, and a negative pulse voltage is applied to the target, carbon ions are extracted from the hybrid plasma. When the carbon shunting arc ionizes the methane gas, an rf plasma is initiated and the ionization of methane is significantly enhanced in the rf plasma. The plasma density in the hybrid plasma increases by a factor of approximately 5-9 compared to that of the shunting arc discharge. |
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Keywords: | Metal arc source Shunting arc Plasma-based ion implantation and deposition (PBII& D) RF plasma |
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