Chemical composition and bond structure of carbon-nitride films deposited by CH4/N2 dielectric barrier discharge |
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| Authors: | Abhijit Majumdar,Puneet Mishra,Jü rgen Meichsner |
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| Affiliation: | a Institut für Physik, Ernst-Moritz-Arndt-Universität Greifswald, Domstraße 10a, 17489 Greifswald, Germany
b Surface Physics Division, Saha Institute of Nuclear Physics, 1/AF Bidhan Nagar, Kolkata 700 064, India |
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| Abstract: | Carbon nitride films have been deposited by dielectric barrier discharge with a CH4/N2 gas mixture at different conditions. Fourier Transform Infrared (FTIR) spectroscopy, X-ray photo electron spectroscopy (XPS), Raman spectroscopy, Atomic force microscopy (AFM) and ellipsometry were used to systematically study chemical composition, bond structure and surface morphology of deposited films. Various bonds between carbon, nitrogen, hydrogen, and also oxygen were observed. |
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| Keywords: | CN film Dielectric barrier discharge XPS Infrared spectroscopy |
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