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电镀Ni-S合金的析出过程及非晶态结构的形成
引用本文:杜敏,魏绪钧,王国斌.电镀Ni-S合金的析出过程及非晶态结构的形成[J].材料科学与工艺,1996(3).
作者姓名:杜敏  魏绪钧  王国斌
作者单位:东北大学
摘    要:研究了在含有硫代硫酸钠(Na2S2O3)的镀液中电镀Ni-S非晶态合金的条件。结果表明,Ni-S合金镀膜的成分随着电流密度、镀液中Na2S2O3的含量、镀液pH值的变化而变化,但镀膜结构则由镀膜中硫含量所决定。根据X射线衍射分析,含硫量为15-30at%的镀层具有非晶态结构。此外还对Ni-S合金镀膜的形成过程及电镀条件与镀膜形成的关系进行了研究。

关 键 词:Ni-S合金  电镀  非晶态  结构

The Deposition Process and Preparation of Amorphous Film on Ni-S Alloy by Electroplating Method
Du Min, Wei Xujun, Wang Guobin.The Deposition Process and Preparation of Amorphous Film on Ni-S Alloy by Electroplating Method[J].Materials Science and Technology,1996(3).
Authors:Du Min  Wei Xujun  Wang Guobin
Abstract:Beginning from the formation of amorphous alloy film and its use, the Ni-s amorphous alloy film was deposited by a method using an electroplating bath containing Na2S2O3,and the deposition conditions were considered in detail. The integration of Ni-S alloy film changes in plating current density,Na2SO3 concentration and bath pH, but its structural change is determined by the S content in the deposits. X-ray diffraction patterns show that films containing about 15-30at%S form amorphous alloy. In addition, the process of Ni-S alloy film deposition and the relation of plating conditions and preparations were studied.
Keywords:Ni-S alloy  electroplating  amorphous  structure  
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