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激光直写系统中的对准技术应用研究
引用本文:邱传凯,杜春雷,白临波,周崇喜. 激光直写系统中的对准技术应用研究[J]. 光电工程, 1997, 0(Z1)
作者姓名:邱传凯  杜春雷  白临波  周崇喜
作者单位:中国科学院光电技术研究所微细加工光学技术国家重点实验室
基金项目:微细加工光学技术国家重点实验室基金
摘    要:基于ISI-2802型激光直写系统原有基片的多图形对准方法,针对衍射光学元件(DOE)图形的特点,通过设计合理的对准标记、修改对准识别文件和实验,产生了一套适于DOE图形套刻的对准方案。其对准误差小,达到了系统规定指标。并实验研制出了16位相台阶的DOE,取得了良好的效果。

关 键 词:衍射光学元件,激光光刻机,激光直写,精密定位,对准精度

The Application Research on the Alignment Technique in the Laser Direct Write System
Qiu Chuankai,Du Chunlei,Bai Linbo,Zhou Chongxi. The Application Research on the Alignment Technique in the Laser Direct Write System[J]. Opto-Electronic Engineering, 1997, 0(Z1)
Authors:Qiu Chuankai  Du Chunlei  Bai Linbo  Zhou Chongxi
Abstract:Based on the original multi pattern alignment method of substrate and against the characteristics of the patterns of diffraction optical elements,an alignment method which is suitable for DOE(diffraction optical elements)pattern overlapping precision is generated on the basis of Model ISI 2802 laser direct write system through the reasonable alignment marks designing and experiments.Its alignment error is small and has reached the stipulated specifications.The diffraction optical elements with 16 phase steps have been developed and good effects have been achieved.
Keywords:Diffractive optical elements  Laser photoetching machines  Laser direct write  Precision positioning  Alignment accuracy.
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