Xenon difluoride plasma fluorination of polymer surfaces

Xenon difluoride (XeF₂) plasma treatment of a series of polymers containing different repeat units gives rise to varying levels of surface fluorination. Alkene and aromatic C-H bonds appear to be more susceptible towards reaction compared to their sp³ counterparts. The extent of fluorine incorporation can be accounted for in terms of a structure-behaviour relationship derived from extended Huckel molecular orbital calculations. Comparison with CF₄ plasma modification shows that XeF₂ electrical discharges are more effective at fluorinating polymer surfaces.