Low-Loss Patterned Ground Shield Interconnect Transmission Lines in Advanced IC Processes |
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Authors: | Tiemeijer L.F. Pijper R.M.T. Havens R.J. Hubert O. |
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Affiliation: | Res. Dept., NXP Semicond., Eindhoven; |
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Abstract: | In this paper, we provide an extensive experimental and theoretical study of the benefits of patterned ground shield interconnect transmission lines over more conventional layouts in advanced integrated-circuit processes. As part of this experimental work, we present the first comparative study taken on truly differential transmission line test structures. Our experimental results obtained on transmission lines with patterned ground shields are compared against a predictive compact equivalent-circuit model. This model employs exact closed-form expressions for the inductances, and describes key performance figures such as characteristic impedance and attenuation loss with excellent accuracy |
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