| 硬质合金PECVD设备的研究 |
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| 引用本文： | 谢英. 硬质合金PECVD设备的研究[J]. 硬质合金, 2003, 20(3): 170-173 |
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| 作者姓名： | 谢英 |
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| 作者单位： | 株洲硬质合金集团有限公司,株洲,412000 |
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| 摘 要： | 等离子体增强化学气相沉积 (PECVD)是一种利用高压电场 ,使含有涂层元素的化合物或单质气体激发成等离子体 ,加速化学反应 ,降低沉积温度、提高沉积速率的一种涂层技术 ,使硬质合金表面性能强化 ,并保持基体原有抗弯强度。本文主要介绍了一种硬质合金PECVD设备 ,该设备结构简单 ,能实现低温条件下的化学气相沉积 ,等离子体起到增强沉积反应的作用 ,实验表明该设备能较好地完成TiN -TiCN复合涂层 ,也为进一步研究提供了参考。
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| 关 键 词： | 硬质合金 PECVD 等离子体 涂层 |
| 修稿时间： | 2003-05-16 |
Development of a PECVD System for Cemented Carbides |
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| Xie Ying. Development of a PECVD System for Cemented Carbides[J]. Cemented Carbide, 2003, 20(3): 170-173 |
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| Authors: | Xie Ying |
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| Abstract: | Abstract:Plasma Enhancement Chemical Vapour Deposition (PECVD) is a coating technique for the surface reinforcement of cemented carbides and the maintenace of the bending strength of the substrate. A PECVD system for cemented carbides is introduced. The system is of simple structure and capable of carrying out the chemical vapour deposition at low temperatures, during which plasma plays a role of enhancing the depostion reaction. The experimental results show that this system can successfully deposit the compoud TiN-TiCN coatings, providing useful information for further investigations. |
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| Keywords: | cemented carbide PECVD plasma coating |
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