| 等离子清洗的应用与技术研究 |
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| 引用本文： | 张塍. 等离子清洗的应用与技术研究[J]. 电子工业专用设备, 2006, 35(6): 21-27 |
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| 作者姓名： | 张塍 |
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| 作者单位： | 江苏长电科技股份有限公司,江苏,江阴,214431 |
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| 摘 要： | 对等离子清洗技术在半导体方面的应用做了全面介绍,不仅介绍了有关等离子技术的基本概念、设备技术及其相关装置,而且着重介绍了它在半导体清洗中的应用及其注意事项。
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| 关 键 词： | 等离子体 清洗技术 半导体 研究 |
| 文章编号： | 1004-4507(2006)06-0021-07 |
| 收稿时间： | 2006-05-18 |
| 修稿时间： | 2006-05-18 |
The Application and Technology Research of Plasma Cleaning |
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| ZHANG Cheng. The Application and Technology Research of Plasma Cleaning[J]. Equipment for Electronic Products Marufacturing, 2006, 35(6): 21-27 |
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| Authors: | ZHANG Cheng |
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| Affiliation: | Jiangsu Changjiang Electronics Technology Co., LTD, Jiang yin 214431, China |
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| Abstract: | The article on plasma cleaning technology gives a very comprehensive introduction of its application in the semiconductor, not only introducing the basic concepts of plasma technology, as well as the plasma equipment technology and related devices, but also introducing emphatically its application in semiconductor cleaning and the matters needing attention. |
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| Keywords: | Plasma Cleaning Semiconductor Research |
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