| 8通道-1.6nm Si纳米线阵列波导光栅的设计与制作 |
| |
| 引用本文： | 赵雷.8通道-1.6nm Si纳米线阵列波导光栅的设计与制作[J].光电子．激光,2010(11):1589-1592. |
| |
| 作者姓名： | 赵雷 |
| |
| 作者单位： | 中国科学院半导体研究所集成光电子国家重点实验室; |
| |
| 基金项目： | 国家自然科学基金资助项目(60776057,60837001,60877014); 科技部863计划资助项目(2006AA03Z420) |
| |
| 摘 要： | 设计了基于绝缘层上硅(SOI)材料的8通道Si纳米线阵列波导光栅(AWG),器件的通道间隔为1.6nm,面积为420μm×130μm。利用传输函数法模拟了器件传输谱,结果表明,器件的通道间隔为1.6nm,通道间串扰为17dB。给出了结合电子束光刻(EBL)和感应耦合等离子(ICP)刻蚀技术制备器件的详细流程。光谱测试结果分析表明,器件通道间隔为1.3～1.6nm,通道串扰为3dB,中心通道损耗为11.6dB。
|
| 关 键 词： | 阵列波导光栅(AWG) Si纳米线波导 电子束光刻(EBL) 感应耦合等离子(ICP)刻蚀 |
Design and fabrication of an 8-channel and 1.6 nm arr ayed waveguide grating based on Si nanowires |
| |
| ZHAO Lei.Design and fabrication of an 8-channel and 1.6 nm arr ayed waveguide grating based on Si nanowires[J].Journal of Optoelectronics·laser,2010(11):1589-1592. |
| |
| Authors: | ZHAO Lei |
| |
| Affiliation: | ZHAO Lei,AN Jun-ming,ZHANG Jia-shun,SONG Shi-jiao,WU Yuan-da,HU Xiong-wei(State Key Laboratory on Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China) |
| |
| Abstract: | An ultrasmall 8-channel arrayed waveguide grating (AWG) demultiplexer based on Si nanowire waveguide is designed.The demultiplexer channel spacing is 1.6 nm and its effective area is 420 μm×130 μm.The transimission spectra are simulated by the transimission function method and the results show that the device is with a channel spacing of 1.6 nm and crosstalk of 17 dB.The entire fabrication procedure is given by combining electron beam lithography (EBL) and inductively coupled plasma (ICP) etching technology.The demultiplexing characteristics are observed by a spectrometer and the analytic results show that the channel spacing is from 1.3 nm to 1.6 nm,the crosstalk is 3 dB and the central channel loss is 11.6 dB. |
| |
| Keywords: | arrayed waveguide grating(AWG) Si nanowire waveguide electron beam lithography(EBL) inductively coupled plasma(ICP) etching |
| 本文献已被 CNKI 等数据库收录！ |
| 点击此处可从《光电子．激光》浏览原始摘要信息 |
|
点击此处可从《光电子．激光》下载全文 |
