Industrially-styled room-temperature pulsed laser deposition of titanium-based coatings |
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Authors: | Juergen M Lackner |
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Affiliation: | Laser Center Leoben, JOANNEUM RESEARCH Forschungsgesellschaft mbH, Leobner Strasse 94, A-8712 Niklasdorf, Austria |
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Abstract: | Titanium-based compounds are widely used as coating materials for mechanical, tribological, electrical, optical, catalytic, sensoric, micro-electronical applications due to their exceptionally physical and chemical properties. Recently, the trend of using temperature-sensitive materials like polymers and tool steels with the highest hardness demands new low-temperature coating techniques for protective surface finishing as well as for surface functionalization, but up to now there is lack of industrially scaled vacuum coating techniques at temperatures below 50 °C. An alternative for overcoming this problem is the pulsed laser deposition (PLD) technique, which was up-scaled for industrial demands at Laser Center Leoben of JOANNEUM RESEARCH Forschungsgesellschaft mbH.The current paper summarizes the application of the industrially-scaled PLD technique on the deposition of the presently most important Ti-based coatings: metallic titanium, titanium nitride (TiN), titanium oxide (TiO2) and titanium carbonitride (TiCN). PLD coating allows, even at room temperature, the formation of film structures of Zone-T type of Thornton's structure zone model, both on substrates aligned normal and parallel to the incident vapor flux. The high-energetic deposition conditions are revealed by the occurrence of (2 2 0) textures for the fcc TiN-based films. The dense grown structure affects advantageously the tribological behavior—generally, low wear rates and (for TiCN) very low friction coefficients were found. For TiO2 coatings, growing as a mixture of β-TiO2 and amorphous phases, the easily reproducible change of deposition parameters in the room-temperature PLD allows large differences in the optical transmission and electrical resistance. |
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Keywords: | Pulsed laser deposition PLD Laser ablation Ti TiN TiO2 TiCN |
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