首页 | 本学科首页   官方微博 | 高级检索  
     


Plasma parameters in some industrial vacuum arc deposition systems
Authors:B. Ku?akowska-Pawlak  J. Walkowicz  J. Smolik
Affiliation:a Institute of Inorganic Chemistry and Metallurgy of Rare Elements, Wroc?aw University of Technology, Wyb. Wyspiańskiego 27, 50-370 Wroc?aw, Poland
b Institute of Terotechnology, Pu?askiego 6/10, 26-600 Radom, Poland
Abstract:The interelectrode plasma generated at the same conditions (discharge atmosphere, pressure, arc current) in two industrial arc devices was studied by optical emission spectroscopy. The devices were operated with titanium cathodes in vacuum, N2 or a N2/C2H2 mixture. Voltage-current characteristics of the discharges were also investigated. Results of spectral diagnostics indicated on the partial local thermodynamic equilibrium conditions in the sources. From relative emission intensities of the atomic and ionic species, the electron density and the relative concentration of titanium species were evaluated. The coherence of the results derived from the spectroscopic measurements and those obtained earlier by using other techniques was noted.
Keywords:Vacuum arc   Emission spectroscopy   Titanium   Excitation temperature   Ionization temperature   Electron density
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号