Studies on tin oxide films prepared by electron beam evaporation and spray pyrolysis methods |
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Authors: | K S Shamala L C S Murthy K Narasimha Rao |
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Affiliation: | (1) Department of Instrumentation, Indian Institute of Science, 560 012 Bangalore, India;(2) Department of Physics, Bangalore University, 560 056 Jnanabharathi, Bangalore, India |
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Abstract: | Transparent conducting tin oxide thin films have been prepared by electron beam evaporation and spray pyrolysis methods. Structural,
optical and electrical properties were studied under different preparation conditions like substrate temperature, solution
flow rate and rate of deposition. Resistivity of undoped evaporated films varied from 2.65 × 10−2 ω-cm to 3.57 × 10−3 ω-cm in the temperature range 150–200°C. For undoped spray pyrolyzed films, the resistivity was observed to be in the range
1.2 × 10−1 to 1.69 × 10−2 ω-cm in the temperature range 250–370° C. Hall effect measurements indicated that the mobility as well as carrier concentration
of evaporated films were greater than that of spray deposited films. The lowest resistivity for antimony doped tin oxide film
was found to be 7.74 × 10−4 ω-cm, which was deposited at 350°C with 0.26 g of SbCl3 and 4 g of SnCl4 (SbCl3/SnCl4 = 0.065).
Evaporated films were found to be amorphous in the temperature range up to 200°C, whereas spray pyrolyzed films prepared at
substrate temperature of 300– 370°C were poly crystalline. The morphology of tin oxide films was studied using SEM. |
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Keywords: | Spray pyrolysis electron beam evaporated films tin oxide films transparent conducting coatings optical and electrical properties |
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