| 二元光学器件激光直写技术的研究进展 |
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| 引用本文： | 颜树华,戴一帆,吕海宝,李圣怡.二元光学器件激光直写技术的研究进展[J].半导体光电,2002,23(3):159-162. |
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| 作者姓名： | 颜树华 戴一帆 吕海宝 李圣怡 |
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| 作者单位： | 国防科技大学,机电工程与自动化学院,湖南,长沙,410073 |
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| 基金项目： | 国家自然科学基金;50005022; |
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| 摘 要： | 二元光学器件的激光直写技术可克服传统的半导体工艺(掩模套刻法或多次沉积薄膜法)所带来的加工环节多、对准精度难以控制、周期长、成本高等问题,可进一步提高二元光学器件的制作精度和衍射效率.分析了二元光学器件激光直写的基本原理,对已有的各种激光直写方法和最新研究成果进行了综述,并展望了其发展趋势.
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| 关 键 词： | 二元光学 激光直写 变灰度掩模法 |
| 文章编号： | 1001-5868(2002)03-0159-04 |
| 修稿时间： | 2001年10月30日 |
Research Advances in Technology of Laser Direct Writing for Binary Optical Elements |
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| YAN Shu hua,DAI Yi fan,LU Hai bao,LI Sheng yi.Research Advances in Technology of Laser Direct Writing for Binary Optical Elements[J].Semiconductor Optoelectronics,2002,23(3):159-162. |
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| Authors: | YAN Shu hua DAI Yi fan LU Hai bao LI Sheng yi |
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| Abstract: | The technology of laser direct writing for binary optical elements can overcome the disadvantages caused by the traditional semiconductor technologies, such as multiprocessing steps, difficulty in controlling the accuracy of alignment, long period, and high cost, etc. It can improve the manufacturing precision and diffraction efficiency of binary optical elements. The basic principle of laser direct writing for binary optical elements is analyzed in this paper, followed by overview of available laser direct writing methods and recent progress. Finally, the future development is forecasted. |
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| Keywords: | binary optics laser direct writing gray scale mask method |
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