High-rate pulsed reactive magnetron sputtering of oxide nanocomposite coatings |
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Affiliation: | 1. Technical University of Munich, Germany;2. Aalto University, Finland;3. University of Iceland;1. Faculty of Mechanistic and Electric Engineering, Guangzhou University, Guangzhou, China;2. Department of Computer Science, The University of Auckland, Auckland 1142, New Zealand;1. School of Computer Science and Engineering, Northeastern University, Shenyang 110819, China;2. Software College, Northeastern University, Shenyang 110819, China;3. Department of Electronic & Information Engineering, Hong Kong Polytechnic University, Hong Kong |
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Abstract: | The article reports on the oxide nanocomposite coatings reactively sputtered by a pulsed dual magnetron and is divided into two parts. The first part briefly describes main problems in the reactive sputtering of oxides, i.e. low deposition rate aD and arcing at the target surface and then focuses on the discharge of the dual magnetron. The ways how aD can be increased and arcing eliminated are shown. The second part is devoted to transparent oxide coatings. Two types of oxide coatings are described in detail: (1) Si–Zr–O coatings containing ≤5 at.% of Zr and (2) Zr–Al–O coatings with Zr/Al > 1. It is shown that (a) Si–Zr–O coatings exhibit high thermal stability up to 1500 °C, almost 100% optical transparency and can be deposited with very high aD ≈ 800 nm/min from a molten magnetron target and (b) Zr–Al–O coatings with relatively high hardness H ≈ 18–19 GPa, low effective Young’s modulus E1 satisfying the ratio H/E1 > 0.1 are highly elastic (the elastic recovery We > 70%) and exhibit an enhanced resistance to cracking. The last finding is of key importance for development of new hard coatings with enhanced toughness. |
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