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Mn 掺杂 SiC 基稀磁半导体薄膜的结构和磁性研究
引用本文:孙现科,周小东,周思华,王少辉,蒋卫华,孙春梅.Mn 掺杂 SiC 基稀磁半导体薄膜的结构和磁性研究[J].表面技术,2015,44(7):45-49.
作者姓名:孙现科  周小东  周思华  王少辉  蒋卫华  孙春梅
作者单位:周口师范学院 物理与机电工程学院,河南 周口,466001
基金项目:国家自然科学基金资助项目,河南省教育厅科学技术研究重点项目,周口师范学院博士科研启动经费资助项目(zksybscx201210) Fund:Supported by the National Natural Science Foundation of China,Education Department of Henan,Startup Foundation for Doctors of Zhoukou Normal University
摘    要:目的从原子水平探究Mn掺杂SiC薄膜的磁性起源。方法采用射频磁控溅射技术制备不同掺杂浓度的Mn掺杂SiC薄膜,并采用X射线衍射技术、X光电子能谱、同步辐射X射线近边吸收精细结构技术、物理性质测试系统对薄膜的结构、组分和磁性能进行研究。结果晶体结构和成分分析表明,1200℃退火后的薄膜形成了3C-SiC晶体结构,且随着Mn掺杂浓度的增加,3C-SiC晶体的特征峰向低角度移动。在Mn掺杂浓度(以原子数分数计)为3%,5%,7%的薄膜中,掺杂的Mn原子以Mn2+的形式存在;而在9%Mn掺杂的SiC薄膜中,则有第二相化合物Mn4Si7形成。局域结构分析表明,薄膜中均不存在Mn金属团簇和氧化物,在3%,5%和7%Mn掺杂的薄膜中,掺杂的Mn原子主要以代替C位的形式进入3C-SiC晶格中,而在9%Mn掺杂的薄膜中,掺杂的Mn原子以C替位形式和Mn4Si7共存。磁性测试表明,制备的Mn掺杂SiC薄膜具有室温铁磁性,且饱和磁化强度随着Mn掺杂浓度的提高而增加。结论薄膜的室温铁磁性是本征的,磁性来源与掺杂的Mn原子以Mn2+取代SiC晶格中C位后导致的缺陷有关,符合缺陷导致的束缚磁极子机制。

关 键 词:磁控溅射  SiC  Mn掺杂  铁磁性  缺陷
收稿时间:4/7/2015 12:00:00 AM
修稿时间:2015/7/20 0:00:00

Investigation of Structure and Magnetic Properties of Mn-doped SiC Dilute Magnetic Semiconductors
SUN Xian-ke,ZHOU Xiao-dong,ZHOU Si-hu,WANG Shao-hui,JIANG Wei-hua and SUN Chun-mei.Investigation of Structure and Magnetic Properties of Mn-doped SiC Dilute Magnetic Semiconductors[J].Surface Technology,2015,44(7):45-49.
Authors:SUN Xian-ke  ZHOU Xiao-dong  ZHOU Si-hu  WANG Shao-hui  JIANG Wei-hua and SUN Chun-mei
Affiliation:School of Physics and Electromechanical Engineering, Zhoukou Normal University, Zhoukou 466001, China,School of Physics and Electromechanical Engineering, Zhoukou Normal University, Zhoukou 466001, China,School of Physics and Electromechanical Engineering, Zhoukou Normal University, Zhoukou 466001, China,School of Physics and Electromechanical Engineering, Zhoukou Normal University, Zhoukou 466001, China,School of Physics and Electromechanical Engineering, Zhoukou Normal University, Zhoukou 466001, China and School of Physics and Electromechanical Engineering, Zhoukou Normal University, Zhoukou 466001, China
Abstract:ABSTRACT:Objective To investigate the magnetic origin of Mn-doped SiC films from the atom level. Methods The films of Mn-doped SiC were fabricated by radio frequency-magnetron sputtering. The structure, components and magnetic properties of films were investigated by X-ray diffraction ( XRD) , X-ray photoelectron spectroscopy ( XPS) , X-ray absorption fine structure ( XAFS) and physical property measuring system ( PPMS) , respectively. Results The analysis of crystal structure and composition showed that the structure of 3C-SiC was formed in the films after 1200 ℃ anneal, and with the increasing of Mn content, the characteristic peaks of 3C-SiC moved to lower angle. In 3%, 5% and 7% Mn-doped SiC films, the doping Mn atoms existed in the form of Mn2+ions, but in 9% Mn-doped SiC film, the second phase of compound Mn4 Si7 appeared. The study of local structure of films showed that there were no Mn clusters or Mn-related oxides. The doped Mn atoms existed in the form of substitution for C sites in 3C-SiC lattice in 3%, 5% and 7% Mn-doped SiC films, and in 9% Mn-doped SiC film there was a coexistence of C substitution and com-pound Mn4 Si7 . The magnetic measurement by PPMS showed that the Mn-doped SiC films were ferromagnetic at room temperature, and the saturation magnetization increased with the increasing of Mn content. Conclusion The magnetism of films is intrinsic and relevant to the defects caused by Mn in the form of Mn2+substituted for C in 3C-SiC lattice and is accorded with the bound magnetic polarons ( BMP) mechanism accused by defects.
Keywords:magnetron sputtering  SiC  Mn-doped  ferromagnetism  defect
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