Affiliation: | aUniversité Mentouri de Constantine, Laboratoire de Microsystèmes et Instrumentation (LMI), Faculté des Sciences de l’Ingénieur, Constantine, Algeria bUniversité Mentouri de Constantine Laboratoire d’Etude des Matériaux Electroniques pour, Applications Médicales (LEMEAMED), Faculté des Sciences de l’Ingénieur, Constantine, Algeria cUniversités de Toulouse, Laboratoire Plasma et Conversion d’Energie (LAPLACE), CNRS, INPT, Université Paul Sabatier, I118 Route de Narbonne, 31062 Toulouse Cedex, France |
Abstract: | Wettability of polyimide (PI) and polypropylene (PP) films have been improved using SiOx-like thin layers deposited from a mixture of hexamethyldisiloxane (HMDSO) and oxygen in a microwave distributed electron cyclotron resonance plasma reactor. The films wettability evolution behaviors were evaluated through the results of contact angle measurements, atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The plasma depositions of SiOx thin layers in presence of VUV radiation induce a contact angle decrease to about 7° and 35° for PI and PP films, respectively. XPS data showed that such difference in wettability is attributed to the increase of hydrophilic group's proportion at the surface of coated PI films due to VUV irradiation. AFM images showed that the PI surface topography remains relatively smooth when coated in presence of VUV radiation. However, in the case of PP films, AFM images revealed the growth of irregular structure due to a substrate etching effect supported by VUV radiation. For polymers coated without VUV irradiation, the deconvolution of the C1s peaks showed a significant decrease of C O bonds for both PI and PP substrates. |