Dünne Schichten durch Deposition unter streifenden Einfall |
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Authors: | Bernd Rauschenbach Prof Dr Dr hc Christian Platzig Dr |
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Affiliation: | Leibniz‐Institut für Oberfl?chenmodifizierung (IOM) und Universit?t Leipzig, Institut für Experimentelle Physik II, Permoserstr. 15, 04318 Leipzig, Tel.: (0341) 235 2308 |
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Abstract: | Micro‐ and nanostructured thin films by Glancing angle deposition Physical vapour deposition under conditions of obliquely incident flux and limited adatom diffusion results in films with a columnar microstructure. These columns will be oriented toward the vapour source. An additional substrate rotation can be used to sculpt the columns into various morphologies (slanted and vertical posts, chevrons, screws or spirals). With this glancing angle deposition (GLAD) technique can prepared porous thin films with engineered structures from a variety of dielectric, semiconducting and metallic materials. The paper presents the In this paper the physical fundamentals of the GLAD technique are introduced, the production of micro‐ and nanostructures of different morphology on non‐patterned and patterned substrates is demonstrated and some possible applications of this new deposition technique are introduced. |
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