High-Temperature Behavior of MoSi2 and Mo5Si3 |
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| Authors: | GEORGE B. CHERNIACK A. GRANT ELLIOT |
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| Affiliation: | Research laboratories, lockheed Missiles &Space Company, Palo Alto, California |
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| Abstract: | The high-temperature stability and behavior of MoSi2 was studied by heating dense sintered specimens under a vacuum of 10−5 mm Hg in the temperature range 1700° to 2000°C. The resulting material was examined using physical measurements, X-ray analysis, and metallographic techniques. The decomposition of MoSi2 into Mo5Si3 is described. The Mo5Si3-MoSi2 eutectic temperature was determined as 1900° C, and the melting points of MoSi5 and Mo5Si3 were determined as 1980° and 2085° C, respectively. |
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