Nonwetting,nonrolling, stain resistant polyhedral oligomeric silsesquioxane coated textiles |
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Authors: | Rahul Misra Robert D Cook Sarah E Morgan |
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Affiliation: | School of Polymers and High Performance Materials, The University of Southern Mississippi, Hattiesburg, Mississippi 39406 |
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Abstract: | Cotton/polyester fabric surfaces were modified using nanostructured organic‐inorganic polyhedral oligomeric silsesquioxane (POSS) molecules via solution dip coating. Surface wetting characteristics of coatings prepared from two chemically and structurally different POSS molecules, a closed cage fluorinated dodecatrifluoropropyl POSS (FL‐POSS) and an open cage nonfluorinated trisilanolphenyl POSS (Tsp‐POSS), were evaluated with time and compared with Teflon. Surface analysis, including Atomic Force Microscopy, SEM/EDAX, and NMR revealed the presence of POSS aggregates on the fabric surface leading to a spiky topography, high roughness, and hysteresis. POSS coated fabrics showed complete reversal of surface wetting characteristics with contact angles higher than the benchmark Teflon surface. Water contact angle measured as a function of time showed equivalent or better performance for POSS‐coated surfaces in comparison to Teflon. Furthermore, FL‐POSS coated fabric exhibited exceptional stain and acid resistance along with a 38% reduction in relative surface friction. Additionally, “nonsliding” and high surface adhesion behavior of water droplets on the FL‐POSS coated fabric are reported. © 2009 Wiley Periodicals, Inc. J Appl Polym Sci, 2010 |
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Keywords: | polyhedral oligomeric silsesquioxane fabrics coatings nanotechnology atomic force microscopy |
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