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Fabrication of n‐ and p‐Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self‐Aligned Nanoimprinting |
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| Authors: | Ursula Palfinger Christoph Auner Herbert Gold Anja Haase Johanna Kraxner Thomas Haber Meltem Sezen Werner Grogger Gerhard Domann Georg Jakopic Joachim R. Krenn Barbara Stadlober |
| Affiliation: | 1. Institute of Nanostructured Materials and Photonics, Joanneum Research GmbH, Franz‐Pichlerstrasse 30, A‐8160 Weiz (Austria), Fax: 0043‐316‐876‐2710, Telephone: 0043‐316‐876‐2721;2. Institute for Electron Microscopy, Graz University of Technology, Steyrergasse 17, A‐8010 Graz (Austria);3. Fraunhofer‐Institut für Silicatforschung ISC, Neunerplatz 2, D‐97082 Würzburg (Germany) |
| Abstract: | |
| Keywords: | self‐alignment nanoimprinting high frequency parasitic capacitance |