| 光助芬顿法降解印制电路板脱膜废液 |
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| 引用本文： | 郭新超,金奇庭,王艳芳,孙长顺,薛峰.光助芬顿法降解印制电路板脱膜废液[J].土木与环境工程学报,2005,27(5):91-95. |
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| 作者姓名： | 郭新超 金奇庭 王艳芳 孙长顺 薛峰 |
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| 作者单位： | 1. 西安建筑科技大学,环境与市政工程学院,西安,710055
2. 总后勤部建筑工程研究所,西安,710032 |
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| 摘 要： | 研究表明,采用UV/Fenton均相光催化氧化体系降解印制电路板脱膜废液效果好.在H2O2用量为1倍理论药量,Fe":H2O2(摩尔比)=1:20,光照时间为80 min,脱膜废液COD去除率可达80%.光助芬顿体系降解脱膜废液的诸多影响因素中,重要性次序依次为H2O2投药比＞FeSO4/H2O2的比值＞光照时间.
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| 关 键 词： | 均相光催化 脱膜废液 |
| 文章编号： | 1006-7329(2005)05-0091-05 |
| 修稿时间： | 2005年4月15日 |
Degradation of PCB Waste Stripping Liquid Using UV/Fenton |
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| GUO Xin-chao,JIN Qi-ting,WANG Yan-fang,SUN Chang-shun,XUE feng.Degradation of PCB Waste Stripping Liquid Using UV/Fenton[J].Journal of Civil and Environmental Engineering,2005,27(5):91-95. |
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| Authors: | GUO Xin-chao~ JIN Qi-ting~ WANG Yan-fang~ SUN Chang-shun~ XUE feng~ |
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| Affiliation: | GUO Xin-chao~,JIN Qi-ting~,WANG Yan-fang~,SUN Chang-shun~,XUE feng~ |
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| Abstract: | The study shows that there will be a good effect to degrade printed circuit board(PCB) waste stripping liquid using UV/Fenton homogeneous photochemical catalysis system.The removal rate of COD could reach 80% at the conditions with double dose of H_2O_2,1:20 mol ratio of Fe~(2+):H_2O_2 and 80min hydraulic retention time(HRT).In all influential factors the H_2O_2 dosing ratio is the most important by order,then follows the ratio of FeSO_4/H_2O_2,and at last the illumination time. |
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| Keywords: | UV/Fenton |
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