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Co/Cu纳米多层膜的制备及巨磁阻性能的研究
引用本文:胡滢,曹为民,印仁和,俞文清,曾绍海,王慧娟.Co/Cu纳米多层膜的制备及巨磁阻性能的研究[J].功能材料,2005,36(2):187-189.
作者姓名:胡滢  曹为民  印仁和  俞文清  曾绍海  王慧娟
作者单位:上海大学,理学院化学系,上海,200436;上海大学,理学院化学系,上海,200436;上海大学,理学院化学系,上海,200436;上海大学,理学院化学系,上海,200436;上海大学,理学院化学系,上海,200436;上海大学,理学院化学系,上海,200436
基金项目:国家自然科学基金资助项目(20271062),上海市教委青年基金资助项目(02AQ83)
摘    要:采用恒电位双电解槽法在硼酸镀液体系中,以单晶Si(111)为基底电沉积制备Co/Cu多层膜,确定了双槽法制备多层膜的工艺条件,为得到优良的多层膜巨磁阻材料,镀液体系中加入了自制的添加剂。并用扫描电镜(SEM)表征了多层膜的断面形貌,小角度X射线衍射(LXRD)谱图中出现了2个衍射峰,大角度X射线衍射(MXRD)谱图中强衍射峰的两侧出现了卫星峰,表明多层膜具有超晶格结构。用物性测量系统(PPMS)测试了Co/Cu多层膜的巨磁阻(GMR)性能,GMR值达到52.52%。

关 键 词:电沉积  Co/Cu纳米多层膜  X射线衍射  巨磁阻效应
文章编号:1001-9731(2005)02-0187-03
修稿时间:2004年5月22日

Study of giant magnetoresistence of Co/Cu multilayers prepared by electrochemical deposition
HU Ying,CAO Wei-min,YIN Ren-he,YU Wen-qing,ZENG Shao-hai,WANG Hui-juan.Study of giant magnetoresistence of Co/Cu multilayers prepared by electrochemical deposition[J].Journal of Functional Materials,2005,36(2):187-189.
Authors:HU Ying  CAO Wei-min  YIN Ren-he  YU Wen-qing  ZENG Shao-hai  WANG Hui-juan
Abstract:Co/Cu multilayers were prepared by using double-bath method containing boric acid solution. The technological conditions were determined by cathodal polarization curves of Si(111) electrode in plating solution with different concentration of Cu~(2+) or Co~(2+).Two diffraction peaks in the LXRD indicated that the multiplayer has periodic structure,and satellite peaks in the MXRD patterns indicate that the multilayer has formed a superlattice structure.Which was confirmed by cross-section SEM image of Co/Cu multilayers. in addition,GMR measured by physical property measure system was high up to 52.52%.
Keywords:electrocrystallization  cobalt/copper multilayers  X-ray diffraction  giant magnetoresistance
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