| 物理气相沉积法沉积类金刚石膜时触发电路的设计 |
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| 引用本文： | 袁安富,程仲元,王珉.物理气相沉积法沉积类金刚石膜时触发电路的设计[J].机械制造与自动化,1999(4). |
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| 作者姓名： | 袁安富 程仲元 王珉 |
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| 作者单位： | 南京航空航天大学机电学院!210016 |
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| 摘 要： | 在物理气相沉积过程中,触发真空间隙是整个试验过程中最基本的一步,很多因素影响真空间隙的成功触发,本文对此加以讨论,并提供一个合适的触发电路.
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| 关 键 词： | 电弧触发 真空沉积 电路 |
Design of Triggering Circuit Used in Diamond-like Film Deposition by PVD |
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| Yuan,Anfu Chen,Zhongyuan Wang,Min.Design of Triggering Circuit Used in Diamond-like Film Deposition by PVD[J].Machine Building & Automation,1999(4). |
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| Authors: | Yuan Anfu Chen Zhongyuan Wang Min |
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| Abstract: | It is essential to trigger the vacuum gap in the process of physical vacuum Deposition (PVD). According to practical experience, there are several factors influencing successful ignition. The paper presents a successful triggering circuit with necessary discussion. |
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| Keywords: | arc triggering vacuum deposition circuit |
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