Electrical,optical, and structural properties of thin films with tri-layers of AZO/ZnMgO/AZO grown by filtered vacuum arc deposition |
| |
Authors: | Leonardo C Gontijo Alfredo G Cunha Pedro AP Nascente |
| |
Affiliation: | 1. Instituto Federal do Espírito Santo, Programa de Pós-Graduação em Engenharia Metalúrgica e de Materiais, CEP 29444-030 Vitória, ES, Brazil;2. Universidade Federal do Espírito Santo, Departamento de Física, CEP 29075-910 Vitória, ES, Brazil;3. Universidade Federal de São Carlos, Departamento de Engenharia de Materiais, CEP 13565-905 São Carlos, SP, Brazil |
| |
Abstract: | Transparent conductive oxides (TCO) are indispensable as front electrode for most of thin film electronic devices such as transparent electrodes for flat panel displays, photovoltaic cells, windshield defrosters, transparent thin film transistors, and low emissivity windows. Thin films of aluminum-doped zinc oxide (AZO) have shown to be one of the most promising TCOs. In this study, three layered Al-doped ZnO (AZO)/ZnMgO/AZO heterostructures were prepared by filtered cathodic arc deposition (FCAD) on glass substrates. The objective is to find a set of parameters that will allow for improved optical and electrical properties of the films such as low resistivity, high mobility, high number of charge carriers, and high transmittance. We have investigated the effect of modifications in thickness and doping of the ZnMgO inner layer on the structural, electrical, and optical characteristics of the stacked heterostructures. |
| |
Keywords: | Aluminum-doped zinc oxide Filtered cathodic arc deposition Transparent conducting oxide Heterostructures |
本文献已被 ScienceDirect 等数据库收录! |
|