Studies on switching mechanisms in Pd-nanodot embedded Nb2O5 memristors using scanning tunneling microscopy |
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Authors: | M.K. Hota M.K. Bera S. VermaC.K. Maiti |
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Affiliation: | a VLSI Engineering Laboratory, Department of Electronics and ECE, Indian Institute of Technology, Kharagpur 721302, Indiab Institute of Physics, Bhubaneswar 751005, India |
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Abstract: | Current imaging tunneling spectrum obtained from scanning tunneling microscopy has been used to probe the formation and/or rupture of conductive filaments responsible for bipolar switching in Pd nano-dots embedded Nb2O5 memristors. Filamentary conduction mechanism has been confirmed by scanning tunneling microscopy study using a Pt-Ir tip that enabled performing electroforming and reset operations at the nanoscale. The back and forth transition between the fully oxidized and metallic sub-oxide states of niobium under applied bias, as observed from X-ray photoelectron spectroscopy, is believed to be the source of bipolar switching in Nb2O5 memristors. The incorporation of Pd nanodots in Nb2O5 matrix plays a critical role by acting as an oxygen ion reservoir and/or by polarizing a large volume of oxygen vacancies. The formation and/or rupture of the conducting filaments through trapping-detrapping phenomena are found to boost the memristive switching performance. |
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Keywords: | Memristor STM Nb2O5 |
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