| 化学机械抛光垫沟槽形状的研究及展望 |
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| 引用本文： | 姚蔚峰,邓乾发,胡永亮,范红伟,刘盾,袁巨龙.化学机械抛光垫沟槽形状的研究及展望[J].新技术新工艺,2010(7):62-65. |
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| 作者姓名： | 姚蔚峰 邓乾发 胡永亮 范红伟 刘盾 袁巨龙 |
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| 作者单位： | 浙江工业大学,超精密加工研究中心,浙江,杭州310014 |
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| 基金项目： | 浙江省科技厅项目资助，浙江工业大学科研启动项目资助 |
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| 摘 要： | 在化学机械抛光过程中,沟槽形状是抛光垫性能的重要影响因素之一,它会直接影响抛光效果。本文介绍了化学机械抛光垫上沟槽的基本形状及其对抛光效果的影响,以及不同复合形状的抛光垫沟槽及其对抛光效果的影响,并就研究中现存的主要问题提出展望。
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| 关 键 词： | 化学机械抛光 抛光垫 沟槽形状 |
Study and Outlook on Groove Shape of CMP Polishing Pad |
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| YAO Weifeng,DENG Qianfa,HU Yongliang,FAN Hongwei,LIU Dun,YUAN Julong.Study and Outlook on Groove Shape of CMP Polishing Pad[J].New Technology & New Process,2010(7):62-65. |
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| Authors: | YAO Weifeng DENG Qianfa HU Yongliang FAN Hongwei LIU Dun YUAN Julong |
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| Affiliation: | (Ultra-precision Machining Research Center, Zhejiang University of Technology, Hangzhou 310014 ,China) |
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| Abstract: | In the chemical and mechanical polishing process, the groove shape is one of the most critical elements that affect polishing pad performance, which directly influences the polishing process and results. The basic patterns of groove shape and their effects on polishing are described. Various sorts of groove shape with complex components and their effects on polishing are also described. The expectation for the solution of present problems in research and is proposed in the final part of the paper. |
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| Keywords: | Chemical mechanical polishing Polishing pad Groove shape |
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