Control of temperature uniformity during the manufacture of stable thin-film photovoltaic devices |
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| Affiliation: | 1. International Centre for Science and High Technology, Trieste, Italy;2. Department of Mechanical Engineering, University of Colorado at Boulder, Campus Box 427, Boulder, CO 80309-0427, United States;3. Tata Research Development and Design Centre, Pune 411 013, India;4. Colorado State University, Fort Collins, CO 80521, United States;1. Tianjin Key Laboratory of Equipment Design and Manufacturing Technology, Tianjin University, Tianjin 300072, China;2. General Motors Global Research and Development Center, Warren, MI 48090, USA;3. Department of Mechanical Engineering, University of Hawai‘i at Mānoa, Honolulu, HI 96822, USA;1. College of Mechanical Electronical and Engineering, North China University of Technology, Beijing 100144, China;2. China Academy of Engineering Physics, Mianyang 621900, China;3. School of Materials and Metallurgy, Wuhan University of Science and Technology, Wuhan 430081, China |
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| Abstract: | The production of stable thin-film photovoltaic cells requires tight control of temperature uniformity within the glass substrates during the vacuum deposition process. Though traditional approaches such as radiation shielding and channeling more power to outer lamps result in substantial improvements in temperature uniformity they fail in meeting the stringent requirement of less than 1 °C variation across the substrate required to guarantee the long-term stability of the devices. The problem becomes especially acute while scaling up to larger commercially-viable panel sizes. To this end, a finite element thermal model of a commercial-scale deposition station has been developed and optimized with the target of achieving the desired temperature uniformity of 1 °C. The effects of improvements such as radiation shielding, addition of radiation spreader, contouring of radiation spreader and optimizing power distribution among the radiation lamps have been studied. A new lamp configuration has been proposed for attaining the desired uniformity levels. |
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