Selfaligned AlGaAs/GaAs HBT grown by MOMBE

The very low parasitic resistance n-p-n GaAs/AlGaAs heterojunction bipolar transistors (HBT) grown by metal organic molecular beam epitaxy (MOMBE) using all gaseous source dopants are reported. The carbon and tin dopants were introduced through the uses of trimethygallium (TMGa) and tetraethyltin (TESn). To achieve the low parasitics, the graded InGaAs emitter cap layer was doped with tin to 5*10/sup 19/ cm/sup -3/ and the doping level in the subcollector was 3*10/sup 18/ cm/sup -3/. The emitter and collector sheet resistances were 25 Omega / Square Operator and 10 Omega / Square Operator , respectively. The 800 AA thick base layer was carbon doped to a level of 7*10/sup 19/ cm/sup -3/. The base contact resistance and sheet resistance were 0.1 Omega mm and 180 Omega / Square Operator , respectively. With a thin AlGaAs surface passivation layer for the emitter-base junction, the common emitter DC current gain was maintained up to 25, even for 2*5 mu m/sup 2/ emitter size devices. The unity short circuit current gain cutoff frequency f/sub T/, and maximum oscillation frequency f/sub max/, were 48 and 63 GHz, respectively.<>