偏离映射的烙画风格绘制

针对非真实感绘制烙画艺术风格模拟技术中可能存在的背景单一、绘制速度慢以及缺少细节及写意效果等问题,提出一种自动的、基于偏离映射的烙画风格绘制方法。算法采用对烙画的前景和背景图像分别处理再进行融合的方法,首先通过边界扩充、种子点填充、L2距离优化等改进的纹理合成算法,将样本合成为烙画背景图像,扩展了背景题材;其次,采用各向异性滤波平滑前景图像的结构张量场,并沿张量场局部曲线方向进行线积分卷积计算的方法突出了烙画前景写意风格的特点,同时通过图像增强技术增强了局部细节和结构信息。此外,采用改进的Phong光照明模型将前景图像偏离映射到背景图像中。最终的实验结果突出了细节信息和写意效果,增强了艺术表现力,提高了绘制速度,能模拟出真实的烙画艺术效果。

Rendering pyrography style painting based on deviation mapping

Traditionally, the Non-photorealistic rendering pyrography technology has the insufficients that background is single, rendering speed is slowly and details can not be reflected in the final artistic effect. In this paper, a new measurement model about pyrography simulation based on the deviation mapping was proposed to avoid these disadvantages. Firstly, the background of the pyrography could be obtained based on the texture synthesis technique. Many optimizations such as searching along a spiral path, edge expansion, L2 distance computing predigesting accelerated synthesis speed and the final results was also advanced. Secondly, based on the tensor field, the foreground image was filtered based on the anisotropic and line integral convolution methods to show enjoyable style feature. The technique of image enhancement was also used to enhance the local structure and details. Additionally, Phong illumination model would be used to map the foreground image to the background image. Experimental results show that the details and freehand enjoyable character can be produced. So, the proposed method can simulate the real pyrography effect.