| 碳氮膜的沉积工艺及其结构研究 |
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| 引用本文： | 付志强,顾子平,等.碳氮膜的沉积工艺及其结构研究[J].广东有色金属学报,2001,11(2):134-137. |
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| 作者姓名： | 付志强 顾子平 |
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| 作者单位： | [1]广州有色金属研究院材料表面工程技术研究开发中心，广东广州510651 [2]广州凯得控股有限公司，广东广州510730 |
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| 基金项目： | 广东省自然科学基金项目 (95 0 734) |
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| 摘 要： | 以氨气为反应气体，用真空阴极电弧沉积法制备了CNx膜，研究了工艺参数对膜层的沉积速率，化学成分的影响及膜层结合状态，结果表明，沉积速率随着氨气分压的提高而下降，当氨气分压达到6．7Pa时将没有膜的沉积；CNx膜主要由碳和氮组成，降低真空系统的抽速，将反应气体导至靶面附近，提高氨气分压可以提高膜层中氮含量，氮是以化合态存在于膜层中。
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| 关 键 词： | 电弧沉积 VCAD 氨气 增氮膜 |
Research on deposition and structure of CN_x films |
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| FU Zhi qiang\,GU Zi\|ping\,YUAN Zhen hai\,DENG Qi sen\,LIN Song sheng\,ZHENG Jian hong\,DAI Da huang\.Research on deposition and structure of CN_x films[J].Journal of Guangdong Non-Ferrous Metals,2001,11(2):134-137. |
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| Authors: | FU Zhi qiang\ GU Zi\|ping\ YUAN Zhen hai\ DENG Qi sen\ LIN Song sheng\ ZHENG Jian hong\ DAI Da huang\ |
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| Affiliation: | 1. Research & Development Center for Materials & Surface Engineering Technique under Guangzhou Research Institute of Non f |
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| Abstract: | CN x films were fabricated with ammonia as reactive gas by means of vacuum cathodic arc deposition method; the effect of deposition parameters on deposition rates and chemical composition in CN x coatings was studied and chemical bond status of CN x coatings was also analyzed.It was showed that the deposition rate of CN x films decreased with the increase of ammonia partial pressure; the coatings were mainly composed of C and N,and N content in CN x could be increased by decreasing pumping rate of vacuum system, guiding ammonia to the surroundings of the target and increasing ammonia partial pressure; nitrogen existed in the coatings in chemical bond status. |
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| Keywords: | electrical arc deposition method ammonia CN x films |
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