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Grain size and strain in thin sputter-deposited Ni0.8Fe0.2 and Cu films
Authors:D. G. Neerinck   A. E. M. De Veirman   M. H. J. Slangen   Th. G. S. M. Rijks  J. C. S. Kools
Affiliation:

a Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA, Eindhoven, The Netherlands

b Department of Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, The Netherlands

c Bekaert Corporate Research, Bekaertstraat 2, B-8550, Zwevegem, Belgium

d Philips Semiconductors, Gerstweg 2, 6534 AE, Nijmegen, The Netherlands

Abstract:The average grain size and strain in the direction parallel to the surface of thin Ni0.8Fe0.2 and Cu films, sandwiched between Ta layers, have been determined as a function of layer thickness by grazing incidence X-ray diffraction. The in-plane grain size and grain size distribution were also assessed by plan-view transmission electron microscopy. Standard θ-2θ X-ray powder diffraction was used to determine the uniform strain in the direction perpendicular to the surface. Both for Ni0.8Fe0.2 and Cu, an elongation of the lattice parameter perpendicular to the surface and a compression of the lattice parameter in the plane of the film is observed, which decreases with increasing film thickness. Additionally, for Ni0.8Fe0.2 a non-uniform elongation of the perpendicular interactomic distance at the Ta interfaces is deduced by fitting a kinematical model to the θ-2θ diffraction spectrum. This study illustrates the strength and the complementary character of standard powder X-ray diffraction, grazing incidence X-ray diffraction and transmission electron microscopy for the structural analysis of thin metal films.
Keywords:Sputtering   Structural properties   Transmission electron microscopy   X-ray diffraction
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