| 光敏聚酰亚胺的合成 |
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| 引用本文： | 孙自淑.光敏聚酰亚胺的合成[J].辽宁化工,2007,36(10):660-662. |
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| 作者姓名： | 孙自淑 |
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| 作者单位： | 常州纺织服装职业技术学院,纺织化学工程系,江苏,常州,213164 |
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| 摘 要： | 光敏聚酰亚胺以其优良的性能在许多高新技术领域中得到了广泛的应用,是当今国内外学者的研究热点.采用均苯四酸二酐(PMDA)分别与4,4,-二氨基二苯醚(ODA)、3,3,-二甲基联苯胺(DMPA)进行三元共聚,通过改变两种二胺单体的摩尔比,合成出一系列光敏聚酰亚胺.采用IR、TGA等测试手段对聚合物的结构与性能进行了表征和研究.
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| 关 键 词： | 光敏聚酰亚胺 共聚 耐热性 |
| 文章编号： | 1004-0935（2007）10-0660-03 |
| 修稿时间： | 2007-05-10 |
Synthesis of Photosensitive Polyimide |
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| SUN Zi-shu.Synthesis of Photosensitive Polyimide[J].Liaoning Chemical Industry,2007,36(10):660-662. |
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| Authors: | SUN Zi-shu |
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| Affiliation: | Department of Textile Chemical Engineering of Changzhou Textile and Garment Institute;Changzhou 213164;China |
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| Abstract: | Due to excellent performences,photosensitive polyimides(PSPIs) was gainded extensive applications in many new technology fields and became the research hotspot.Through molecular designing,a series of copolymerized photosensitive polyimides(PSPIs) have been synthesized from pyromellitic dianhydride(PMDA),4,4'-diaminodiphenyl ether(ODA) and dimethyl phenylamide(DMPA).Their structures were characterized by the means of Fourier transform infrared spectroscopy(FTIR) and the heat resistance of the polymers was studied by thermogravimetric analysis(TGA). |
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| Keywords: | Photosensitive polyimide Copolymerization Hheat-resistent |
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