脉冲磁控溅射MoS2涂层的组织结构及摩擦学性能

采用单极性脉冲磁控溅射技术在A286基体表面制备MoS₂低摩擦系数涂层(LFC)。利用XRD、SEM等手段表征涂层的成分与微观组织；采用原位纳米力学测试系统、球-盘式摩擦磨损试验机分析涂层的力学和摩擦学性能,并探讨了脉冲偏压对涂层结构、力学和摩擦学性能的影响。结果表明,脉冲偏压由300V增加到600V,MoS₂涂层择优取向发生了(002)向(100)转变,当脉冲偏压增至800V时又恢复(002)择优取向,；随着脉冲偏压的增加,涂层的硬度及弹性模量出现先减少后增大趋势,摩擦系数在0.065~0.076范围内波动,呈现出先增加后减小趋势；偏压为800V的涂层摩擦学性能最佳,其磨损率仅为基体的13.5%。

Structure and Tribological Properties of MoS2 Films Deposited by Unipolar Pulse Magnetron Sputtering

MoS₂ films wre prepared on A286 substrate by unipolar pulse magnetron sputtering. The morphology,microstructure and composition of the films were characterized by using scanning electron microscopy, X-ray diffractometer. The mechanical properties and tribological behavior in air of the films were investigated by using nano-indentation tester and ball-on-disc tribotester. This paper discusses effects of pulsed bias on microstructure, mechanical properties and tribological properties of MoS₂ Films. The results show that the preferential oriention of coatings changes from (002) to (100) in advance with the pulse bias voltage increasing from 300 V to 600 V. When the pulse bias voltage increasing to 800V, the preferential oriention renews to (002), and the film was of smooth and compact structure.With the pulse bias voltage increasing, the hardness and elastic modulus will decrease firstly and increase afterward. The friction coefficient fluctuated in the range of 0.065~0.076 and show the tendency of increasing firstly and decreasing afterward. When the bias voltage is 800 V, the property and performance of friction is the best. The wearing rate is only 13.5% of the substrate, It shows the lower friction coeffient and the good wearing resistance.