Structural and electrical properties of Ti-Al thin films |
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| Authors: | Anna Górecka-Drzazga Zbigniew Ziołowski |
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| Affiliation: | Institute of Electron Technology, Technical University, Wroc?aw Poland;Institute of Ferrous Metallurgy, Gliwice Poland |
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| Abstract: | We have studied thin films of Ti-Al for use as resistance elements. It was found that Ti-40 wt.% Al thin films with a resistivity of 10 ω/□ possess stable characteristics. We have also studied the structure of Ti-Al thin films. Analysis of electron and X-ray diffraction patterns showed that Ti-40 wt.% Al films contained a fine-grained disordered intermetallic face-centred cubic TiAl phase whereas bulk TiAl had a tetragonal CuAu-type structure. |
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